| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To facilitate thickly forming an electrode with a narrow line width, in a method of manufacturing a square solar cell. <P>SOLUTION: Resist is applied by a spin coat method to an anti-reflective coating 2 formed on the front surface of a square silicon substrate 1 and is prebaked. Then, the resist is again applied thereon by the spin coat method and is baked, thus forming a bilayer resist film 3. The resist film 3 is exposed and developed according to the electrode pattern. Then the anti-reflective coating 2 not covered by the resist film 3 is etched. After a metal layer 4 is vapor deposited on the silicon substrate 1, lift-off for removing resist is done to form an electrode 10. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
