发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME |
摘要 |
<p>Provided are a semiconductor device wherein switching loss is reduced, and a stable movement thereof and the reliability can be ensured; and a method for producing the same. A gate insulation film (37) is provided over a n-type source region (34), a p-type body region (33), and a depression region (36). A gate electrode (38) is provided on the gate insulation film (37) so that the gate electrode covers a part of the n-type source region (34), a part of the p-type body region (33), and a part of the depression region (36); and an end of the gate electrode is disposed above the depression region (36). The gate insulation film (37) is formed so that a thickness tdep thereof at a position corresponding to the end of the gate electrode (38) on the depression region (36) is larger than a thickness tch thereof on the p-type body region (33) which functions as a channel region.</p> |
申请公布号 |
WO2010073991(A1) |
申请公布日期 |
2010.07.01 |
申请号 |
WO2009JP71142 |
申请日期 |
2009.12.18 |
申请人 |
MITSUBISHI ELECTRIC CORPORATION;OHTSUKA KENICHI;MIURA NARUHISA;NAKAO YUKIYASU |
发明人 |
OHTSUKA KENICHI;MIURA NARUHISA;NAKAO YUKIYASU |
分类号 |
H01L29/78;H01L21/336;H01L29/12 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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