发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
摘要 <p>Provided are a semiconductor device wherein switching loss is reduced, and a stable movement thereof and the reliability can be ensured; and a method for producing the same.  A gate insulation film (37) is provided over a n-type source region (34), a p-type body region (33), and a depression region (36).  A gate electrode (38) is provided on the gate insulation film (37) so that the gate electrode covers a part of the n-type source region (34), a part of the p-type body region (33), and a part of the depression region (36); and an end of the gate electrode is disposed above the depression region (36).  The gate insulation film (37) is formed so that a thickness tdep thereof at a position corresponding to the end of the gate electrode (38) on the depression region (36) is larger than a thickness tch thereof on the p-type body region (33) which functions as a channel region.</p>
申请公布号 WO2010073991(A1) 申请公布日期 2010.07.01
申请号 WO2009JP71142 申请日期 2009.12.18
申请人 MITSUBISHI ELECTRIC CORPORATION;OHTSUKA KENICHI;MIURA NARUHISA;NAKAO YUKIYASU 发明人 OHTSUKA KENICHI;MIURA NARUHISA;NAKAO YUKIYASU
分类号 H01L29/78;H01L21/336;H01L29/12 主分类号 H01L29/78
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