| 发明名称 |
METHOD FOR MEASURING THICKNESS OF METAL FILM, AND METHOD AND APPARATUS FOR PROCESSING SUBSTRATE |
| 摘要 |
<p>A method for measuring the thickness of a metal film is provided with: a step of irradiating a subject to be measured (11) with measuring light to be used for measuring film thickness; a step of detecting the reflectance of the subject to be measured (11) based on reflection light from the subject to be measured (11); and a step of determining the thickness of the subject to be measured (11), based on the measured reflectance data obtained from the detected reflectance of the subject to be measured (11) and on basic reflectance data to be the base of film thickness determination. The subject to be measured (11) is a metal film having conductivity. The thickness of the metal film is equivalent to or less than the thickness which does not permit the whole measuring light entered the metal film to be absorbed in the metal film.</p> |
| 申请公布号 |
WO2010073935(A1) |
申请公布日期 |
2010.07.01 |
| 申请号 |
WO2009JP70869 |
申请日期 |
2009.12.15 |
| 申请人 |
TOKYO ELECTRON LIMITED;KASAI SHIGERU;SUZUKI TOMOHIRO;NISHIMURA YOSHIHIRO;TATSUMOTO YOSHITAKA |
发明人 |
KASAI SHIGERU;SUZUKI TOMOHIRO;NISHIMURA YOSHIHIRO;TATSUMOTO YOSHITAKA |
| 分类号 |
G01B11/06;C23C14/14;C23C14/54;H01L21/66 |
主分类号 |
G01B11/06 |
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