| 摘要 |
A positive resist composition capable of improving the occurrence of standing waves on the side walls of a resist pattern, and a method of forming a resist pattern that uses such a positive resist composition. The positive resist composition comprises a resin component (A) that displays improved alkali solubility under the action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (A) comprises a structural unit (a1) derived from hydroxystyrene, and a structural unit (a2) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and the component (B) comprises a diazomethane based photoacid generator as the primary component. |
