发明名称 Etching resist
摘要 <p>An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.</p>
申请公布号 EP2202578(A1) 申请公布日期 2010.06.30
申请号 EP20090015884 申请日期 2009.12.22
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;NITTO DENKO CORPORATION 发明人 KURIHARA, KAZUMA;NAKANO, TAKASHI;SHIMA, TAKAYUKI;TOMINAGA, JUNJI;FUJIOKA, KAZUYA;SUEHIRO, ICHIRO
分类号 G03F7/00;G02B5/00;G11B7/24;H01L21/308 主分类号 G03F7/00
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