| 摘要 |
PURPOSE: A film deposition apparatus is provided to deposit a multi-layered film in a single chamber in which a plurality of target are formed. CONSTITUTION: A film deposition apparatus comprises first transfer units(110,210), two or more target parts(220,230), a processing chamber(200), a gate chamber(100), and a buffer chamber(300). The first transfer units horizontally move a transfer tray in which a substrate is placed. The target parts are formed in a region facing the first transfer units. The processing chamber comprises a vent unit(240) which is formed between the target parts. The gate chamber receives the transfer tray from the processing chamber and discharges the tray to outside. The buffer chamber temporarily stores the transfer tray carried from the processing chamber and provides the transfer tray to the processing chamber again.
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