EXPOSURE MASK AND METHOD FOR FORMING SEMICONDUCTOR DEVICE BY USING THE SAME

摘要

PURPOSE: An exposure mask and a method for forming a semiconductor device using the same are provided to prevent scum on a cell edge by forming an auxiliary pattern in parallel with a unit cell. CONSTITUTION: A cell array comprises a light shielding pattern(23) of a line shape. An auxiliary pattern(25) is formed on the cell array in the same direction. The light shielding pattern includes a line pattern and a space pattern. The light shielding patterns are formed on the inner side(400) of a cell edge. The auxiliary patterns are formed on the outer side(500) of the cell edge.