发明名称 |
UNIT FOR TRANSFERRING A WAFER AND PROBE STATION INCLUDING THE SAME |
摘要 |
<p>PURPOSE: A wafer transfer unit and a probe station including the same are provided to efficiently remove particles on a wafer by reducing static electricity between particles on the wafer by using an ionizer. CONSTITUTION: A rotation plate(110) is prepared. A transfer arm is arranged on the upper side of the rotation plate. A driving unit linearly moves the transfer arm. A cover(150) covers the rotation plate and the transfer arm. The cover includes an opening which induces the flow of the air. An ionizer(170) removes the static electricity between the particles remaining on the wafer.</p> |
申请公布号 |
KR20100071243(A) |
申请公布日期 |
2010.06.29 |
申请号 |
KR20080129885 |
申请日期 |
2008.12.19 |
申请人 |
SECRON CO., LTD. |
发明人 |
JIN, JEON HO;CHOI, KI UK;JUNG, JIN YUNG;HWANG, IN WOOK;KIM, WOO YEOL;HWANG, CHAN WOOK |
分类号 |
H01L21/677;B25J15/00;H01L21/66;H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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