发明名称 GRINDING SILICON DIOXIDE USING CHEMICAL METHODS
摘要 FIELD: chemistry. ^ SUBSTANCE: invention can be used to obtain silicon dioxide dispersions. A dispersion of porous anionic particles of silicon dioxide with a modified surface contains a liquid and silicon dioxide particles. The maximum fractional filled volume (Fmax) of the said particles in the said liquid is at least 0.55 and can be calculated using formula , where F is the fractional filled volume of solid substances in the liquid, Fmax is asymptotic limit of the fractional filled volume while approaching infinity, b is intrinsic viscosity, 0 is viscosity of the liquid/solvent, is viscosity of the dispersion. The dispersion is obtained by forming a suspension from silicon oxide particles and liquid with its subsequent grinding. The said suspension contains a chemical agent which increases the volume fraction of the particles in the dispersion. The invention also relates to a coating composition and a coating on a substrate which contains the said dispersion. ^ EFFECT: invention enables to obtain stable silicon dioxide dispersions with high content of solid substances. ^ 31 cl, 2 tbl, 5 ex
申请公布号 RU2393114(C2) 申请公布日期 2010.06.27
申请号 RU20070101377 申请日期 2005.06.15
申请人 V.R. GREJS EHND KO.-KONN. 发明人 CHEPMEHN DEHVID MONRO
分类号 C01B33/00;C01B33/141;C01B33/193;C08K3/36 主分类号 C01B33/00
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