| 发明名称 |
Method for production of multilayer NITRide FILM |
| 摘要 |
A method for production of multilayer nitride film WN/TiN/TiOincludes target sputtering, forming a film by ion implantation into the grating of cold polycrystalline tungsten substrate of ionized atoms of titanium target and reactive nitrogen gas. Film of WN/TiN is covered from the outside with layer of titanium oxide. |
| 申请公布号 |
UA50837(U) |
申请公布日期 |
2010.06.25 |
| 申请号 |
UA20090013528U |
申请日期 |
2009.12.25 |
| 申请人 |
VOLODYMYR DAL EAST-UKRAINIAN NATIONAL UNIVERSITY |
发明人 |
DZIUBA VIACHESLAV LEONIDOVYCH;KLIAHINA NATALIIA AFANASIVNA;VASETSKA LARYSA OLEKSANDRIVNA |
| 分类号 |
C23C16/34 |
主分类号 |
C23C16/34 |
| 代理机构 |
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