| 发明名称 |
CYCLIC COMPOUND COMPOSITION AND ITS PRODUCTION METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist material having high sensitivity and high resolution. <P>SOLUTION: This composition contains one to four kinds of cyclic compounds represented by general formula (1) äwherein, mR<SP>1</SP>groups [(m) is one to four kinds of integers selected from 0 to 7] among 8R<SP>1</SP>groups are hydroxyl groups, and nR<SP>1</SP>groups [(n) is one to four kinds of integers selected from 8-(m)] are identical substituents except the hydroxyl group} in an amount of ≥90%. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010138115(A) |
申请公布日期 |
2010.06.24 |
| 申请号 |
JP20080316144 |
申请日期 |
2008.12.11 |
| 申请人 |
IDEMITSU KOSAN CO LTD |
发明人 |
ISHII HIROTOSHI;KUSABA TOSHIAKI;MIYAMOTO SHINJI;KASHIWAMURA TAKASHI;YOMOGIDA TOMOYUKI;SHIOYA HIDEAKI;OWADA TAKANORI |
| 分类号 |
C07C39/225;C07C37/20;C07C67/31;C07C69/712;G03F7/039;H01L21/027 |
主分类号 |
C07C39/225 |
| 代理机构 |
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