发明名称 REMOVAL OF BULGE EFFECTS IN NANOPATTERNING
摘要 A nanostructure without bulges and a method of fabricating the nanostructure are provided. The method includes forming a nanopattern on a surface of a polymer, allowing the surface of the polymer with the nanopattern to come into contact with a predetermined solvent, and applying an external stimulus to the surface of the polymer in contact with the solvent to remove bulges around the nanopattern formed during formation of the nanopattern. Accordingly, the bulges of the nanostructure where the nanopattern is formed may be removed at a low cost and in a simple manner.
申请公布号 US2010159229(A1) 申请公布日期 2010.06.24
申请号 US20090534015 申请日期 2009.07.31
申请人 SHIN CHAE-HO;JEON IN-SU;KHIM ZHEONG GOU 发明人 SHIN CHAE-HO;JEON IN-SU;KHIM ZHEONG GOU
分类号 B32B3/26;B29C59/02 主分类号 B32B3/26
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