<p>A fluoromonomer and a fluoropolymer which are useful in lithographic resist compositions or as ingredients for synthesizing various optical materials. The fluoromonomer is represented by R2O-(R1)-CF2-C(Rf1)(Rf2)-OR3 (wherein R1 is a saturated divalent C1-8 hydrocarbon group; R2 is a linear, branched, or cyclic monovalent C2-20 unsaturated hydrocarbon group which has a radical-polymerizable carbon-carbon double bond and may contain an oxygen atom and in which some or all of the hydrogen atoms may have been replaced with a fluorine atom; R3 is a saturated monovalent C1-20 hydrocarbon group or a hydrogen atom; and Rf1 and Rf2 are the same or different and each is a saturated monovalent C1-6 fluorohydrocarbon group or C6-10 fluoroaryl group). The fluoropolymer is obtained by polymerizing the fluoromonomer.</p>
