| 摘要 |
A rework method of a metal structure and devices thereof. A rework method may include forming a first metal layer over an insulating layer having a contact plug, a metal interconnection layer over a first metal layer and/or a second metal layer over a metal interconnection layer. A rework method may include performing a first wet etch process to remove first and/or second metal layers, except for a portion below a metal interconnection layer, removing a metal interconnection layer through a second wet etch process and/or planarizing a remaining portion of a first metal layer and/or a surface of an insulating layer through a first planarization process. An increase of a size of a contact hole, for example due to an over exposure of a contact hole, may be minimized.
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