SYSTEM FOR PROCESSING A LITHOGRAPHY SAMPLE BY LASER BEAM INTERFERENCE

摘要

The invention relates to a system for processing a lithography sample by means of laser beam interference, in which a number "2n" of mirrors are positioned on a spatial plane (3), on which mirrors "2n" laser beams (1) are incident, said spatial plane (3) being parallel to a plane (4) containing the sample to be processed and the interference point "P" of the laser beams (1). The aforementioned point "P" is on the bisectors of the pairs of laser beams (1), each pair of laser beams (1) being in a plane normal to the plane (4) of the sample which can be moved and rotated around three Cartesian axes.