MANUFACTURING METHOD OF THIN SILICON SOLAR CELLS

摘要

PURPOSE: A manufacturing method of a thin film silicon solar cell is provided to form a polycrystalline silicon layer which can withstand low temperatures by forming the polycrystalline silicon layer while inducing crystallization through a catalyst metal. CONSTITUTION: A seed metal layer(110) is formed on a substrate. A capping layer(120) is formed on the upper side of the seed metal layer. A first amorphous silicon layer is formed on the substrate and includes the capping layer. A first polycrystalline silicon layer is formed by the crystallization of the first amorphous silicon layer. A second amorphous silicon layer is formed on the first polycrystalline silicon layer. A second polycrystalline silicon layer(136) is formed by the crystallization of the second amorphous silicon layer.