发明名称 |
Method for forming microscopic structures on a substrate |
摘要 |
The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited. |
申请公布号 |
EP2199433(A1) |
申请公布日期 |
2010.06.23 |
申请号 |
EP20090179781 |
申请日期 |
2009.12.18 |
申请人 |
FEI COMPANY |
发明人 |
DE JONG, ALAN;MULDERS, JOHANNES;MACKUS, ADRIE;KESSELS, ERWIN |
分类号 |
C30B25/02;C23C16/04;C30B23/02 |
主分类号 |
C30B25/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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