发明名称 Method of fabricating turning mirror using sacrificial spacer layer and device made therefrom
摘要 The present invention is a method of fabricating a waveguide using a sacrificial spacer layer. The first step in this process is to fabricate the underlying optical semiconductor structure. A trench is then etched in this structure resulting in an underlying L-shaped structure. A sacrificial spacer layer is deposited in the trench. The waveguide is created in the trench on the sacrificial spacer layer using a mask layer to angle the vertex of the L-shaped structure. User-defined portions of the sacrificial spacer layer are subsequently removed to create air gaps between the waveguide and the sidewalls of the trench in the optical semiconductor.
申请公布号 US7741136(B1) 申请公布日期 2010.06.22
申请号 US20090454493 申请日期 2009.05.13
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE DIRECTOR, NATIONAL SECURITY AGENCY 发明人 FITZ JOHN L.;HINKEL DANIEL S.;HORST SCOTT C.
分类号 H01L21/00 主分类号 H01L21/00
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