发明名称 |
Method of fabricating turning mirror using sacrificial spacer layer and device made therefrom |
摘要 |
The present invention is a method of fabricating a waveguide using a sacrificial spacer layer. The first step in this process is to fabricate the underlying optical semiconductor structure. A trench is then etched in this structure resulting in an underlying L-shaped structure. A sacrificial spacer layer is deposited in the trench. The waveguide is created in the trench on the sacrificial spacer layer using a mask layer to angle the vertex of the L-shaped structure. User-defined portions of the sacrificial spacer layer are subsequently removed to create air gaps between the waveguide and the sidewalls of the trench in the optical semiconductor.
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申请公布号 |
US7741136(B1) |
申请公布日期 |
2010.06.22 |
申请号 |
US20090454493 |
申请日期 |
2009.05.13 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE DIRECTOR, NATIONAL SECURITY AGENCY |
发明人 |
FITZ JOHN L.;HINKEL DANIEL S.;HORST SCOTT C. |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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