SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A substrate processing apparatus and a method for manufacturing a semiconductor device are provided to rapidly inform the generation of a congested step to an operator when a processing step is congested. CONSTITUTION: A processing system processes a substrate. A control unit(3) controls the processing system based on a transfer controller(11), a temperature controller(12) and a pressure controller(13). An operating unit(2) displays the progress of the processing step on an operation screen. The control unit reads a process recipe file and a recovery recipe file from a hard disc(1c).