发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE IN WHICH BOTTOM SURFACE AND SIDE SURFACE OF SEMICONDUCTOR SUBSTRATE ARE COVERED WITH RESIN PROTECTIVE FILM
摘要 PURPOSE: A method for manufacturing a semiconductor device is provided to prevent the warpage of a semiconductor substrate by attaching a support plate on the upper side of a cylindrical electrode and a sealing film through an adhesive layer. CONSTITUTION: An insulating film is formed on a semiconductor wafer. A bump electrode for an external connection is formed on the insulating film. A sealing film(12) is formed around the bump electrode for the external connection. A support plate(24) is attached on the upper side of the bump electrode and the sealing film through an adhesive layer(23). A groove(28) is formed on the lower side of the semiconductor wafer. A resin protective layer(11) is formed on the lower side of the semiconductor wafer.
申请公布号 KR20100067050(A) 申请公布日期 2010.06.18
申请号 KR20090120372 申请日期 2009.12.07
申请人 CASIO COMPUTER CO., LTD. 发明人 KOROKU TAISUKE;OKADA OSAMU;KUWABARA OSAMU;SHIOTA JUNJI;FUJII NOBUMITSU
分类号 H01L21/78;H01L23/28 主分类号 H01L21/78
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