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发明名称
Verfahren zur Herstellung einer Gateelektrode eines Feldeffekttransistors mit verringertem Gatewiderstand
摘要
申请公布号
DE10056873(B4)
申请公布日期
2010.06.17
申请号
DE20001056873
申请日期
2000.11.16
申请人
ADVANCED MICRO DEVICES INC.
发明人
HORSTMANN, MANFRED;STEPHAN, ROLF;WIECZOREK, KARSTEN;KRUEGEL, STEPHAN
分类号
H01L21/336;H01L21/28;H01L29/423;H01L29/49;H01L29/78
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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