| 摘要 |
<p>A micromachined sensor with quadrature suppression comprising:
a quadrature suppression electrode; and
a resonator mass positioned adjacent to the quadrature suppression electrode, the resonator mass capable of moving substantially parallel to the quadrature suppression electrode, the resonator mass including a notch formed adjacent to a portion of the quadrature suppression electrode such that a length of the resonator mass that is directly adjacent to the quadrature suppression electrode varies as the resonator mass moves relative to the quadrature suppression electrode, wherein the quadrature suppression electrode is capable of producing a lateral force on the resonator mass that varies based on the length of the resonator mass that is directly adjacent to the quadrature suppression electrode.</p> |
