COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a copolymer useful as a photosensitive resin having excellent adhesivity to substrates and forming patterns having high sensitivity and high resolution.

SOLUTION: The copolymer is obtained by polymerizing a monomer mixture comprising at least a vinyl monomer containing a plurality of carbon-carbon double bonds in the molecule [except a (meth) acrylate derivative and a (meth)acrylamide derivative] (vinyl monomer A) and a carboxy group- or carboxylic acid anhydride group-containing vinyl monomer (vinyl monomer B). The vinyl monomer A includes a compound represented by formula (1) (wherein R1is hydrogen or hydrocarbon that may contain a substituent; R2, R3and R4may be the same as or different from each other and are each hydrogen or methyl; X is connecting group; and n is an integer of 1-3).

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