发明名称 MEMBER WITH CLEANING SURFACE AND METHOD OF REMOVING CONTAMINATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a member with a cleaning surface for capturing particulates in a lithographic apparatus. <P>SOLUTION: The particulates are captured by a plurality of projections that are arranged in a pattern shape. By using a sensor, polluting particulates in a pattern can be detected, using a sensor. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010135788(A) 申请公布日期 2010.06.17
申请号 JP20090270949 申请日期 2009.11.30
申请人 ASML NETHERLANDS BV 发明人 VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;BOEREMA MARK DREWES;RUHM MATTHIAS;PUTZ MARIO
分类号 H01L21/027;B08B3/04;B08B9/22;G03F7/20 主分类号 H01L21/027
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