发明名称 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
摘要 An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.
申请公布号 WO2010067905(A2) 申请公布日期 2010.06.17
申请号 WO2009JP71189 申请日期 2009.12.11
申请人 FUJIFILM CORPORATION;HIRANO, SHUJI;IWATO, KAORU;SAEGUSA, HIROSHI;IIZUKA, YUSUKE 发明人 HIRANO, SHUJI;IWATO, KAORU;SAEGUSA, HIROSHI;IIZUKA, YUSUKE
分类号 G03F7/004;G03F7/039;G03F7/075;G03F7/20 主分类号 G03F7/004
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