| 摘要 |
Fourier filters, systems configured to fabricate Fourier filters and systems and methods configured to inspect specimens are provided herein. One Fourier filter configured for use in an inspection system comprises an array of patterned features formed within an optically opaque layer. The array of patterned features is generally configured to block light reflected and diffracted from structures on a specimen and to allow light scattered from defects on the specimen to pass through the filter. The array of patterned features is generally formed by removing select portions of the optically opaque layer to create transmissive regions, which only allow the light scattered from the defects to pass through. In one embodiment, the select portions of the optically opaque layer are removed with laser light.
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