发明名称 |
DETECTION METHOD OF EPITAXIAL STACKING FAULTS ON EPITAXIAL WAFER |
摘要 |
PURPOSE: A method for detecting the epitaxial stacking faults of an epitaxial wafer is provided to detect the epitaxial stacking faults in real time using a surface scanner with a scattering method. CONSTITUTION: A sample epitaxial wafer is prepared(S100). Faults of the sample epitaxial wafer are detected using a multi beam scanner(S110). The epitaxial stacking faults of an epitaxial wafer is classified by marking the kinds of the faults. The faults are detected using a scattering surface scanner. The detected faults by the multi-beam scanner are matched to the detected faults by the scattering surface scanner.
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申请公布号 |
KR20100062528(A) |
申请公布日期 |
2010.06.10 |
申请号 |
KR20080121211 |
申请日期 |
2008.12.02 |
申请人 |
SILTRON INC. |
发明人 |
KIM, IN KYUM;KANG, HEE BOG;SHIM, JUNG JIN |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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