| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist surface modifying liquid and a method for forming a resist pattern using the resist surface modifying liquid used as a surface treatment liquid prior to the post exposure baking (PEB) processing of a resist film to reduce the water repellency of the resist film to thereby restrain the occurrence of a defect. <P>SOLUTION: The resist surface modifying liquid used as the surface treatment liquid prior to the post exposure baking (PEB) processing of the resist film contains an acidic compound, and an alcohol-based solvent represented by a predetermined general formula and/or an ether-based solvent represented by a predetermined general formula. <P>COPYRIGHT: (C)2010,JPO&INPIT |
