发明名称 Rapid Patterning of Nanostructures
摘要 A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.
申请公布号 US2010144125(A1) 申请公布日期 2010.06.10
申请号 US20100692610 申请日期 2010.01.23
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 JACOBSON JOSEPH M.;JOO JAE-BUM;VARSANIK JON;AGNIHOTRI VIKRANT
分类号 H01L21/20 主分类号 H01L21/20
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