| 发明名称 |
METHOD OF ETCHING ORGANOSILOXANE DIELECTRIC MATERIAL AND SEMICONDUCTOR DEVICE THEREOF |
| 摘要 |
In some embodiments, a method of etching an organosiloxane dielectric material can include: (a) providing the organosiloxane dielectric material; (b) providing a patterned mask over the organosiloxane dielectric material; and (c) reactive ion etching the organosiloxane dielectric material. Other embodiments are disclosed in this application. |
| 申请公布号 |
WO2010065459(A2) |
申请公布日期 |
2010.06.10 |
| 申请号 |
WO2009US66114 |
申请日期 |
2009.11.30 |
| 申请人 |
ARIZONA BOARD OF REGENTS, FOR AND ON BEHALF OF ARIZONA STATE UNIVERSITY;MARRS, MICHAEL |
发明人 |
MARRS, MICHAEL |
| 分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
| 代理机构 |
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