发明名称 |
INDIUM OXIDE TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING THE SAME |
摘要 |
Disclosed is a transparent conductive film which is formed as an amorphous film by using a sputtering target containing an oxide sintered body which contains indium oxide, and if necessary tin, while containing an additional element having an oxygen binding energy of 100-350 kJ/mol (excluding Ba, Mg and Y) in an amount of not less than 0.0001 mole but less than 0.10 mole per 1 mole of indium. The transparent conductive film contains indium oxide, and if necessary tin, while containing the additional element.
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申请公布号 |
KR20100063135(A) |
申请公布日期 |
2010.06.10 |
申请号 |
KR20107009343 |
申请日期 |
2008.10.03 |
申请人 |
MITSUI MINING & SMELTING CO., LTD. |
发明人 |
TAKAHASHI SEIICHIRO;MIYASHITA NORIHIKO |
分类号 |
C23C14/08;C23C14/34;H01B5/14;H01B13/00 |
主分类号 |
C23C14/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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