发明名称 |
INDIUM OXIDE TARGET |
摘要 |
Disclosed is an indium oxide target comprising an oxide sintered body which contains yttrium in addition to indium oxide and tin. This indium oxide target is characterized in that the contents of tin and yttrium are within such a range that the molar ratio y of tin relative to 1 mole of indium is not less than (-2.5 x 10Ln(x)-5.8 x 10) but not more than (-1.0 x 10Ln(x)-5.0 x 10), which values are expressed by using the molar ratio x of yttrium relative to 1 mole of indium.
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申请公布号 |
KR20100063137(A) |
申请公布日期 |
2010.06.10 |
申请号 |
KR20107009349 |
申请日期 |
2008.10.03 |
申请人 |
MITSUI MINING & SMELTING CO., LTD. |
发明人 |
TAKAHASHI SEIICHIRO;MIYASHITA NORIHIKO |
分类号 |
C23C14/08;C23C14/34;H01B5/14;H01B13/00 |
主分类号 |
C23C14/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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