发明名称 |
Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode |
摘要 |
Wafer level arc detection is provided in a plasma reactor using an RF transient sensor coupled to a threshold comparator, and a system controller responsive to the threshold comparator.
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申请公布号 |
US7733095(B2) |
申请公布日期 |
2010.06.08 |
申请号 |
US20070893353 |
申请日期 |
2007.08.15 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PIPITONE JOHN;FORSTER JOHN C. |
分类号 |
H01H9/50;C23C14/34 |
主分类号 |
H01H9/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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