发明名称 |
ETCHING PROCESSES USED IN MEMS PRODUCTION |
摘要 |
The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.
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申请公布号 |
KR20100061731(A) |
申请公布日期 |
2010.06.08 |
申请号 |
KR20107008055 |
申请日期 |
2008.09.11 |
申请人 |
QUALCOMM MEMS TECHNOLOGIES, INC. |
发明人 |
YAN XIAOMING;HO CHOK;HEALD DAVID;GOUSEV EVGENI;HERTZLER BENJAMIN W.;FLOYD PHILIP;SASAGAWA TERUO;LONDERGAN ANA;BITA ION;ZION TODD LYLE |
分类号 |
H01L21/3213;B01D53/68 |
主分类号 |
H01L21/3213 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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