SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus for improving the resolution of photolithography is provided to uniformly maintain coated layer thickness of the processing liquid by reducing a stripe smudge. CONSTITUTION: A substrate processing apparatus comprises a supporting unit, a coating unit, an ultrasonic radiating member(242) and a resonance member. The supporting unit supports the substrate. The coating unit coats processing solution on a surface of the substrate. The resonance member is arranged in the front surface side of substrate. The ultrasonic irradiation member examines the ultrasonic wave in the processing liquid.