发明名称 NON-VOLATILE MEMORY DEVICES AND METHOD OF FORMING THE SAME
摘要 <p>PURPOSE: A non-volatile memory devices and a method of forming the same are provided to improve a coupling ratio by increasing a contact area of a floating gate and an inter insulating layer. CONSTITUTION: In a non-volatile memory devices and a method of forming the same, an element isolation film(110) is formed on a substrate(100). The element isolation film defines an active area. A turner insulating layer is formed on the top of the substrate. The floating gate(181) is formed on the turner insulating layer. The floating gate has a concavo-convex on side. The floating gate comprises a first conductive pattern(133) and a second conductive pattern(143).</p>
申请公布号 KR20100060893(A) 申请公布日期 2010.06.07
申请号 KR20080119684 申请日期 2008.11.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YANG, SANG RYOL;HWANG, KI HYUN;KIM, HONG JIN;JEON, KYUNG YUB;KIM, SUNG GIL;CHOI, SI YOUNG
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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