| 摘要 |
PURPOSE: An acetal compound is provided to be used as a monomer for a base resin of resist materials by improving resolution and crown dependency in photolithography, especially, dipping lithography which uses high energy beam as a light source. CONSTITUTION: An acetal compound is marked as a chemical formula 1. In the chemical formula 1, R^1 shows a hydrogen atom, a methyl group, or trifluoromethyl group. R^2 shows a straight chained, branched, or cyclic monovalent hydrocarbon group having carbon number of 1-10. R^3 and R^4 show respectively the hydrogen atom, the straight chained, branched, or cyclic monovalent hydrocarbon group having carbon number of 1-10. |
