发明名称 Semiconductor Device and Method of Forming an Interposer Package with Through Silicon Vias
摘要 A semiconductor device is fabricated by providing a carrier for supporting the semiconductor device. A first semiconductor die is mounted to the carrier. The first semiconductor die has a contact pad. A first dummy die is mounted to the carrier. The first dummy die has a through-silicon via (TSV). The first semiconductor die and the first dummy die are encapsulated using a wafer molding material. A first interconnect structure is formed over the first semiconductor die and the first dummy die. The first interconnect structure is connected to the contact pad of the first semiconductor die and the TSV of the first dummy die. The carrier is removed and a second interconnect structure is formed over the first semiconductor die and the first dummy die. The second interconnect structure is connected to the TSV of the first dummy die. A semiconductor package is connected to the second interconnect structure.
申请公布号 US2010133704(A1) 申请公布日期 2010.06.03
申请号 US20080325587 申请日期 2008.12.01
申请人 STATS CHIPPAC, LTD. 发明人 MARIMUTHU PANDI CHELVAM;SUTHIWONGSUNTHORN NATHAPONG;SHIM IL KWON;HENG KOCK LIANG
分类号 H01L23/52;H01L21/00;H01L23/28;H01L23/48 主分类号 H01L23/52
代理机构 代理人
主权项
地址