发明名称 ALIGNMENT UNIT AND WAFER TRANSFER DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an alignment unit which can detect that a notch is registered in a notch registered position after alignment of a wafer to perform stable transference to an upper device, and a wafer transfer device using the alignment unit. SOLUTION: A wafer alignment unit includes: a rotating mechanism holding and rotating a wafer; and a line sensor irradiating light on the circumference of the wafer to detect the light reception amount of the irradiated light, and detects the amount of eccentricity of the wafer and a notch position formed on the circumference of the wafer from the light reception amount of the line sensor to correct the position of the wafer. The wafer alignment has a notch misregistration detecting sensor which detects misregistration of the notch after termination of the alignment. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010123824(A) 申请公布日期 2010.06.03
申请号 JP20080297512 申请日期 2008.11.21
申请人 HITACHI HIGH-TECH CONTROL SYSTEMS CORP 发明人 SEKI TOSHINORI;ITO TAKANORI
分类号 H01L21/68 主分类号 H01L21/68
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