发明名称 WAVELENGTH SHIFT MEASURING APPARATUS, OPTICAL SOURCE APPARATUS, INTERFERENCE MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a wavelength shift measuring apparatus capable of measuring fluctuation of an optical source wavelength with accuracy and resolution of not greater than pm by being equipped with a construction in which an optical path difference of two light beams stably becomes constant. <P>SOLUTION: A wavelength shift measuring apparatus is a wavelength shift detector WLCD1 which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter BS2 splitting the light beam emitted from the light source into a plurality of light beams and to synthesize two light beams among the plurality of light beams to generate an interference light, a spacer member SP provided so that an optical path length difference of the two light beams split by the beam splitter PBS2 is constant, and a plurality of photoelectric sensors PDA+, PDB+ detecting the interference light generated by the beam splitter BS2. The plurality of photoelectric sensors PDA+, PDB+ output a plurality of interference signals having phases shifted from one another based on the interference light to measure a wavelength shift using the plurality of interference signals. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010122207(A) 申请公布日期 2010.06.03
申请号 JP20090223435 申请日期 2009.09.28
申请人 CANON INC 发明人 ISHIZUKA AKIRA
分类号 G01J9/02;G01B9/02;G01B11/00;H01L21/027 主分类号 G01J9/02
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