| 摘要 |
PROBLEM TO BE SOLVED: To reduce air bubbles generated from developer liquid by a simple configuration, and to reduce undissected defects of a resist pattern. SOLUTION: This development device suppresses foaming of developer liquid in a development room by being provided with a discharge section that discharges developer liquid on an exposed substrate, a development room that accommodates the substrate and the discharge section, and a pressure device that pressurizes the inside of the development room. Otherwise, the air bubbles generated from developer liquid inside the development room are suppressed by being provided with a developer liquid tank that supplies developer liquid to the discharge section and a pressure reduction device that depressurizes the inside of the developer liquid tank, thereby removing gas in the developer liquid within the developer liquid tank by force. COPYRIGHT: (C)2010,JPO&INPIT |
