发明名称 LOAD LOCK CHAMBER FOR LARGE AREA SUBSTRATE PROCESSING SYSTEM
摘要 The present invention generally includes a load lock chamber for transferring large area substrates into a vacuum processing chamber. The load lock chamber may have one or more separate, environmentally isolated environments. Each processing environment may have a plurality exhaust ports for drawing a vacuum. The exhaust ports may be located at the corners of the processing environment. When a substrate is inserted into the load lock chamber from the factory interface, the environment may need to be evacuated. Due to the exhaust ports located at the corners of the environment, any particles or contaminants that may be present may be pulled to the closest corner and out of the load lock chamber without being pulled across the substrate. Thus, substrate contamination may be reduced.
申请公布号 WO2010025253(A3) 申请公布日期 2010.06.03
申请号 WO2009US55200 申请日期 2009.08.27
申请人 APPLIED MATERIALS, INC.;BEHDJAT, MEHRAN;KURITA, SHINICHI;INAGAWA, MAKOTO;ANWAR, SUHAIL 发明人 BEHDJAT, MEHRAN;KURITA, SHINICHI;INAGAWA, MAKOTO;ANWAR, SUHAIL
分类号 H01L21/00;H01L21/02 主分类号 H01L21/00
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