| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring device that improves measuring accuracy of the wave surface aberration of an optical system, and an exposure system including the measuring device. <P>SOLUTION: The measuring device for measuring the wave surface aberration of the optical system 7 is provided with: a smoothing portion 12 that smoothes not only first information including information relative to the wave surface aberration distribution along a first direction of the optical system 7 in a second direction perpendicular to a first direction but also second information including information relative to the wave surface aberration distribution along the second direction of the optical system 7; and a wave surface aberration operating portion 14 that operates two-dimensional wave surface aberration distribution of the optical system 7, based on the first and second information smoothed by the smoothing portion 12. <P>COPYRIGHT: (C)2010,JPO&INPIT |
