| 摘要 |
A TiO-containing quartz glass substrate which, when used as a molding substrate for nanoimprint lithography, can form a rugged pattern having dimensional fluctuations within ±10%. The TiO-containing quartz glass substrate is characterized in that the coefficient of thermal expansion at 15-35°C is within ±200 ppb/°C, the TiOconcentration is 4-9 wt.%, and the TiOconcentration distribution in the substrate surface on the side where a transfer pattern is to be formed is within ±1 wt.%.
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