发明名称 Device and method for the evaporative deposition of a coating material
摘要 According to a first aspect, the present invention relates to a device for depositing a high temperature superconductor onto a substrate in vacuum comprising a refilling device for containing a stock of high temperature superconductor material, an evaporation device, that evaporates the high temperature superconductor material within an evaporation zone by means of an energy transferring medium, and a conveyor that transports the high temperature superconductor material continuously from the refilling device to the evaporation zone in such a way that the high temperature superconductor material delivered into the evaporation zone is evaporated essentially without residues. According to a further aspect, the present invention relates to a method to evaporate a high temperature superconductor coating onto a substrate in vacuum, comprising the steps of continuous delivery of granular high temperature superconductor material into an evaporation zone and the operation of a beam of an energy transferring medium, so that the delivered granulate is evaporated in the evaporation zone essentially without residues.
申请公布号 US7727335(B2) 申请公布日期 2010.06.01
申请号 US20050533776 申请日期 2005.10.13
申请人 THEVA DUNNSCHICHTTECHNIK GMBH 发明人 KINDER HELMUT
分类号 C23C16/00;C23C14/00;C23C14/08;C23C14/24;C23C14/28;C23C14/30 主分类号 C23C16/00
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