| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for imprinting, which is used to form an organic film improved in restorative force, chemical resistance, heat resistance, dimensional stability and curing density, and a method for forming an organic film on a substrate by using the composition. <P>SOLUTION: The photosensitive resin composition for imprinting includes an erythritol-based monomer or oligomer having a specific structure. The organic film formed by using the composition is improved in restorative force, chemical resistance, heat resistance, dimensional stability and curing density. Since the composition is suitable for an imprinting process, an organic film having a refined pattern can be easily formed on a substrate by the imprinting process. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
