| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound, to provide an acid-generating agent by using the compound, to provide a resist composition containing the acid-generating agent, and to provide a resist pattern-forming method using the resist composition. <P>SOLUTION: The resist composition contains a base material component (A) changing the solubility in an alkali developing liquid by the action of an acid, and an acid-generating agent component (B) containing a compound represented by formula (b1-1) (wherein, R<SP>1</SP>" to R<SP>3</SP>" are each aryl or alkyl, with the proviso that at least one thereof is substituted aryl substituted with a group represented by formula (b1-1-0), and any two thereof may form a ring by bonding to each other in combination with sulfur in the formula; X<SP>10</SP>is a 1-30C hydrocarbon; Q<SP>3</SP>is a single bond or a divalent linking group; Y<SP>10</SP>is -C(=O)- or -SO<SB>2</SB>-; Y<SP>11</SP>is 1-10C alkyl or fluorinated alkyl; and W is 2-10C alkylene). <P>COPYRIGHT: (C)2010,JPO&INPIT |
