发明名称 METHOD FOR CONTROLLED FORMATION OF THE RESISTIVE SWITCHING MATERIAL IN A RESISTIVE SWITCHING DEVICE AND DEVICE OBTAINED THEREOF
摘要 The present disclosure provides a method for controlled formation of the resistive switching layer in a resistive switching device. The method comprises providing a substrate (2) comprising the bottom electrode (10), providing on the substrate a dielectric layer (4) comprising a recess (7) containing the metal for forming the resistive layer (11), providing on the substrate a dielectric layer (5) comprising an opening (8) exposing the metal of the recess, and forming the resistive layer in the recess and in the opening.
申请公布号 US2010127233(A1) 申请公布日期 2010.05.27
申请号 US20070439414 申请日期 2007.08.31
申请人 NXP, B.V.;INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC) 发明人 GOUX LUDOVIC;WOUTERS DIRK
分类号 H01L45/00;H01L21/16;H01L29/00 主分类号 H01L45/00
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