发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which can be adapted to a high frequency, can improve a heat dissipation property, and furthermore can reduce cost while improving an yield as compared with the case that a semi finished product such as a semiconductor chip having no seal film is delt. <P>SOLUTION: The method of manufacturing the semiconductor device includes: a first semiconductor constitution preparation process which prepares a first semiconductor constitution 1a having a first external connection electrode; a second semiconductor constitution preparation process which prepares a second semiconductor constitution 1b having a second seal film provided so as to cover a second external connection electrode and the second external connection electrode; a fixing process which fixes the second semiconductor constitution at a central portion of the first semiconductor constitution via an adhesive layer 12; and an insulating film forming process which forms an insulating film on an upper face of the first semiconductor constitution and on an upper face of the second semiconductor constitution. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010118679(A) 申请公布日期 2010.05.27
申请号 JP20100012972 申请日期 2010.01.25
申请人 CASIO COMPUTER CO LTD 发明人 MIHARA ICHIRO
分类号 H01L25/065;H01L23/12;H01L25/07;H01L25/18 主分类号 H01L25/065
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