发明名称 METHOD FOR IMMOBILIZING ACTIVE MATERIAL ON SUBSTRATE SURFACE
摘要 PROBLEM TO BE SOLVED: To provide a method for immobilizing an active material on the surface of a substrate. SOLUTION: The present invention relates to a method for immobilizing the active material on the surface of the substrate. The method includes the steps of cleaning the substrate, reforming the surface of the substrate with a hydroxyl group, making use of vapor of an organic silane compound under an atmospheric pressure to reform the surface of the substrate, and immobilizing the active material on an end of the surface of the substrate. The method requires no vacuum condition or carrier gas, and is capable of forming a uniform, high-density, reproducible monomolecular film of the silane compound in an inexpensive, easy manner and immobilizing the active material on the thus formed monomolecular film of the silane compound. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010117339(A) 申请公布日期 2010.05.27
申请号 JP20090091015 申请日期 2009.04.03
申请人 KOREA ELECTRONICS TELECOMMUN 发明人 KIM AN-SOON;AH CHIL-SEONG;YANG HYE-KYOUNG;PARK CHAN-WOO;YANG JONG-HEON;AHN CHANG-GEUN;BAEK IN-BOK;KIM TAE-YOUB;SUNG GUN-YONG;PARK SEON-HEE
分类号 G01N33/543;B82B3/00;C12M1/00;C12N15/09;G01N37/00 主分类号 G01N33/543
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